Plasma enhanced metalorganic chemical vapor deposition of amorphous aluminum nitride
H. Harris; N. Biswas; H. Temkin; S. Gangopadhyay; M. Strathman
- 作者H. Harris; N. Biswas; H. Temkin; S. Gangopadhyay; M. Strathman
- 文件大小330.68KB
- 发表时间2001
- DOI10.1063/1.1413484