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Plasma enhanced metalorganic chemical vapor deposition of amorphous aluminum nitride

Plasma enhanced metalorganic chemical vapor deposition of amorphous aluminum nitride

H. Harris; N. Biswas; H. Temkin; S. Gangopadhyay; M. Strathman
  • 作者H. Harris; N. Biswas; H. Temkin; S. Gangopadhyay; M. Strathman
  • 文件大小330.68KB
  • 发表时间2001
  • DOI10.1063/1.1413484
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