Cu Contamination Effect in Oxynitride Gate Dielectrics
- 期刊名称Journal of The Electrochemical Society
- 作者Lin, Y. H.; Pan, F. M.; Liao, Y. C.; Chen, Y. C.; Hsieh, I. J.; Chin, Albert
- 卷第148卷
- 期第11期
- 印刷ISSN0013-4651
- 文件大小91.85KB
- 发表时间2001
- DOI10.1149/1.1407834
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