SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing
Mahorowala, Arpan P.; Babich, Katherina; Petrillo, Karen E.; Simons, John P.; Angelopoulos, Marie; Patel, Vishnubhai; Grill, Alfred; Halle, Scott; Conti, Richard; Wu, ChungHsi J.; Wise, Richard; Chen, Linda; Thomas, Alan C.; Lee, B.; Genz, Oliver; Dobisz, Elizabeth A.
- 作者Mahorowala, Arpan P.; Babich, Katherina; Petrillo, Karen E.; Simons, John P.; Angelopoulos, Marie; Patel, Vishnubhai; Grill, Alfred; Halle, Scott; Conti, Richard; Wu, ChungHsi J.; Wise, Richard; Chen, Linda; Thomas, Alan C.; Lee, B.; Genz, Oliver; Dobisz, Elizabeth A.
- 卷第4343卷
- 印刷ISSN0277-786X
- 文件大小879.84KB
- 发表时间2001
- DOI10.1117/12.436710
- 页码306-316