Production of low electron temperature ECR plasma for plasma processing
- 作者Naho Itagaki; Yoko Ueda; Nobuo Ishii; Yoshinobu Kawai
- 卷第390卷
- 印刷ISSN0040-6090
- 文件大小173.62KB
- 发表时间2001
- DOI10.1016/s0040-6090(01)00920-8
- 页码202-207
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