SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - When is bilayer thin-film imaging suitable: comparison with single-layer resists
- 作者Halle, Scott; Thomas, Alan C.; Armacost, Michael; Dalton, Timothy J.; Chen, Xiaochun; Bukofsky, Scott J.; Genz, Oliver; Lu, Zhijian G.; Butt, Shahid A.; Chen, Zheng; Ferguson, Richard A.; Coker, Eric; Leidy, Robert K.; Lin, Qinghuang; Mahorowala, Arpan P.; Babich, Katherina; Petrillo, Karen E.; Angelopoulos, Marie; Ignatowicz, Mark; Bui, Bang; Progler, Christopher J.
- 卷第4346卷
- 印刷ISSN0277-786X
- 文件大小343.50KB
- 发表时间2001
- DOI10.1117/12.435797
- 页码970-981
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