SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 29 July 2001)] Charged Particle Detection, Diagnostics, and Imaging - Aberration correction for charged particle lithography
- 作者Munro, Eric; Zhu, Xieqing; Rouse, John A.; Liu, Haoning; Delage, Olivier; Munro, Eric; Rouse, John A.
- 卷第4510卷
- 印刷ISSN0277-786X
- 文件大小419.99KB
- 发表时间2001
- DOI10.1117/12.451284
- 页码218-224
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