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Production of low electron temperature ECR plasma for thin film deposition

Production of low electron temperature ECR plasma for thin film deposition

Naho Itagaki; Yoko Ueda; Nobuo Ishii; Yoshinobu Kawai

作者Naho Itagaki; Yoko Ueda; Nobuo Ishii; Yoshinobu Kawai
印刷ISSN0257-8972
文件大小214.93KB
发表时间2001
DOI10.1016/s0257-8972(01)01204-x
页码546-550

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