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Multiple imprinting in UV-based nanoimprint lithography: related material issues

Multiple imprinting in UV-based nanoimprint lithography: related material issues

M. Bender; M. Otto; B. Hadam; B. Spangenberg; H. Kurz
  • 作者M. Bender; M. Otto; B. Hadam; B. Spangenberg; H. Kurz
  • 印刷ISSN0167-9317
  • 文件大小442.25KB
  • 发表时间2002
  • DOI10.1016/s0167-9317(02)00470-7
  • 页码407-413
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