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[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Integration of capacitor for sub-100-nm DRAM trench technology

[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Integration of capacitor for sub-100-nm DRAM trench technology

Lutzen, J.; Birner, A.; Goldbach, M.; Gutsche, M.; Hecht, T.; Jakschik, S.; Orth, A.; Sanger, A.; Schroder, U.; Seidl, H.; Sell, B.; Schumann, D.
  • 作者Lutzen, J.; Birner, A.; Goldbach, M.; Gutsche, M.; Hecht, T.; Jakschik, S.; Orth, A.; Sanger, A.; Schroder, U.; Seidl, H.; Sell, B.; Schumann, D.
  • 文件大小310.19KB
  • 发表时间2002
  • DOI10.1109/VLSIT.2002.1015442
  • 页码178-179
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