![[American Vacuum Soc 1999 4th International Symposium on Plasma Process-Induced Damage - Monterey, CA, USA (9-11 May 1999)] 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - Effect of plasma density and uniformity, electron temperature, process gas, and chamber on electron shading damage]()
[American Vacuum Soc 1999 4th International Symposium on Plasma Process-Induced Damage - Monterey, CA, USA (9-11 May 1999)] 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - Effect of plasma density and uniformity, electron temperature, process gas, and chamber on electron shading damageSiu, S.; Patrick, R.; Vahedi, V.; Alba, S.; Valentini, G.; Colombo, P. · 1999