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Influence of interface relaxation on passivation kinetics in H[sub 2] of coordination P[sub b] defects at the (111)Si/SiO[sub 2] interface revealed by electron spin resonance

Influence of interface relaxation on passivation kinetics in H[sub 2] of coordination P[sub b] defects at the (111)Si/SiO[sub 2] interface revealed by electron spin resonance

Stesmans, A.
  • 期刊名称Journal of Applied Physics
  • 作者Stesmans, A.
  • 卷第92卷
  • 期第3期
  • 印刷ISSN0021-8979
  • 文件大小438.70KB
  • 发表时间2002
  • DOI10.1063/1.1482427
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