[IEEE 2002 IEEE Hong Kong Electron Devices Meeting - Hong Kong, China (22 June 2002)] Proceedings 2002 IEEE Hong Kong Electron Devices Meeting (Cat. No.02TH8616) - Electrical characteristics of novel hafnium oxide film
Ng, K.L.; Zhan, N.; Poon, M.C.; Kok, C.W.; Chan, M.; Wong, H.
- 作者Ng, K.L.; Zhan, N.; Poon, M.C.; Kok, C.W.; Chan, M.; Wong, H.
- 文件大小137.01KB
- 发表时间2002
- DOI10.1109/hkedm.2002.1029155
- 页码51-54