[Weber Publishing 12th International Crimean Conference on Microwave and Telecommunication Technology (CriMICo'2002) - Sevastopol, Crimea, Ukraine (9-13 Sept. 2002)] 12th International Conference Microwave and Telecommunication Technology - Processing characteristics of ion-chemical etching of single-crystal silicon by complex discharge plasma
- 作者Bordusov, S.V.
- 文件大小312.73KB
- 发表时间2002
- DOI10.1109/crmico.2002.1137300
- 页码426-428
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