MOCVD growth of high reflective GaN/AlGaN distributed Bragg reflectors
Naoyuki Nakada; Hiroyasu Ishikawa; Takashi Egawa; Takashi Jimbo; Masayoshi Umeno
- 作者Naoyuki Nakada; Hiroyasu Ishikawa; Takashi Egawa; Takashi Jimbo; Masayoshi Umeno
- 印刷ISSN0022-0248
- 文件大小277.71KB
- 发表时间2002
- DOI10.1016/s0022-0248(01)02022-x
- 页码961-967