SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Financial impact of technology acceleration on semiconductor masks
- 作者Trybula, Walter J.; Kimmel, Kurt R.; Grenon, Brian J.; Dao, Giang T.; Grenon, Brian J.
- 卷第4562卷
- 印刷ISSN0277-786X
- 文件大小568.17KB
- 发表时间2002
- DOI10.1117/12.458307
- 页码321-328
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