Formation and Properties of an Oxide Film on an Si3N4Surface under Thermal Oxidation

• 作者A. E. Ivanchikov; A. M. Kisel'; V. I. Plebanovich; V. I. Pachynin; V. E. Borisenko
• 卷第32卷
• 期第3期
• 印刷ISSN1063-7397
• 电子ISSN1608-3415
• 文件大小267.22KB
• 发表时间2003-05
• DOI10.1023/a:1023909703326
• 页码145-150