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Voltage dependence of cluster size in carbon films using plasma immersion ion implantation

Voltage dependence of cluster size in carbon films using plasma immersion ion implantation

D.R. McKenzie; R.N. Tarrant; M.M.M. Bilek; G. Pearce; N.A. Marks; D.G. McCulloch; S.H.N. Lim
  • 作者D.R. McKenzie; R.N. Tarrant; M.M.M. Bilek; G. Pearce; N.A. Marks; D.G. McCulloch; S.H.N. Lim
  • 卷第206卷
  • 印刷ISSN0168-583X
  • 文件大小139.09KB
  • 发表时间2003
  • DOI10.1016/s0168-583x(03)00831-0
  • 页码741-744
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