The effect of silicon doping and thermal annealing on the electrical and structural properties of hydrogenated amorphous carbon thin films
- 期刊名称Diamond and Related Materials
- 作者Okpalugo, T
- 印刷ISSN0925-9635
- 文件大小105.18KB
- 发表时间2003-12-31
- DOI10.1016/S0925-9635(03)00518-1
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