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Model relating process variables to film electrical properties for reactively sputtered tantalum oxide thin films

Model relating process variables to film electrical properties for reactively sputtered tantalum oxide thin films

P. Jain; V. Bhagwat; E. J. Rymaszewski; T. M. Lu; S. Berg; T. S. Cale

作者P. Jain; V. Bhagwat; E. J. Rymaszewski; T. M. Lu; S. Berg; T. S. Cale
文件大小367.92KB
发表时间2003
DOI10.1063/1.1543650

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