Structure and Properties of Ti–Si–N Films Deposited by dc Magnetron Cosputtering on Positively Biased Substrates
- 期刊名称Japanese Journal of Applied Physics
- 作者Li, Zhuguo; Miyake, Shoji; Kumagai, Masao; Saito, Hidenori; Muramatsu, Yukihisa
- 卷第42卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小313.20KB
- 发表时间2003-12-10
- DOI10.1143/JJAP.42.7510
- 页码7510-7515
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