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Growth of graphene layers on HOPG via exposure to methyl radicals

Growth of graphene layers on HOPG via exposure to methyl radicals

Ralf Wellmann; Artur Böttcher; Manfred Kappes; Ulrich Kohl; Horst Niehus

作者Ralf Wellmann; Artur Böttcher; Manfred Kappes; Ulrich Kohl; Horst Niehus
卷第542卷
印刷ISSN0039-6028
文件大小333.32KB
发表时间2003
DOI10.1016/s0039-6028(03)00928-2
页码81-93

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