Extreme ultraviolet mask fabrication with high inspection contrast TaSiN[sub x] absorber stack

• 作者J. R. Wasson; E. J. Weisbrod; B. Lu; P. J. S. Mangat; W. J. Dauksher; D. J. Resnick; J. Sohn; R. Engelstad; D. Pettibone
• 文件大小935.52KB
• 发表时间2003
• DOI10.1116/1.1625962