Low Temperature Nitridation of Si Oxide Utilizing Activated Oxygen and Nitrogen
- 期刊名称Japanese Journal of Applied Physics
- 作者Uraoka, Yukiharu; Yano, Hiroshi; Hatayama, Tomoaki; Fuyuki, Takashi
- 卷第42卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小1150.05KB
- 发表时间2003-3-15
- DOI10.1143/JJAP.42.1145
- 页码1145-1149
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