Improvement of SiO 2 /SiC Interface Properties by Nitrogen Radical Irradiation
- 期刊名称Japanese Journal of Applied Physics
- 作者Maeyama, Yuusuke; Yano, Hiroshi; Furumoto, Yoshihisa; Hatayama, Tomoaki; Uraoka, Yukiharu; Fuyuki, Takashi
- 卷第42卷
- 印刷ISSN0021-4922
- 文件大小420.18KB
- 发表时间2003-6-1
- DOI10.1143/JJAP.42.L575
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