High brightness InGaN/GaN LEDs with indium-tin-oxide as p-electrode
- 作者C. S. Chang; S. J. Chang; Y. K. Su; W. C. Lai; C. H. Kuo; C. K. Wang; Y. C. Lin; Y. P. Hsu; S. C. Shei; H. M. Lo; J. C. Ke; J. K. Sheu
- 期第7期
- 印刷ISSN1610-1634
- 电子ISSN1610-1642
- 文件大小113.51KB
- 发表时间2003
- DOI10.1002/pssc.200303384
- 页码2227-2231
Growth and characterization of indium oxide diodes prepared by reactive magnetron sputteringLung-Chien Chen; Sien-Chang Liu · 2006
Growth and characterization of reactively sputtered thin-film platinum oxidesMcBride, J. R.; Graham, G. W.; Peters, C. R.; Weber, W. H. · Journal of Applied Physics · 1991
Growth and characterization of yttrium oxide films by reactive magnetron sputteringJiaqi Zhu; Yuankun Zhu; Weixia Shen; Yongjie Wang; Jiecai Han; Gui Tian; Pei Lei; Bing Dai · 2011
Growth and characterization of tin oxide thin films prepared by reactive sputteringM. Di Giulio; D. Manno; G. Micocci; R. Rella; P. Siciliano; A. Tepore · 1993
Reactive Sputtering Growth and Characterizations of InN Thin Films on Si SubstratesAmirhoseiny, Maryam; Hassan, Zainuriah; Shiong, Ng Sha; Ahmad, Mohd Anas · Advanced Materials Research · 2012
Growth and characterization of NiO thin films prepared by dc reactive magnetron sputteringA. Mallikarjuna Reddy; A. Sivasankar Reddy; Kee-Sun Lee; P. Sreedhara Reddy · 2011
Growth and characterization of zirconium oxynitride films prepared by reactive direct current magnetron sputteringVenkataraj, S.; Kappertz, O.; Jayavel, R.; Wuttig, M. · Journal of Applied Physics · 2002