SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Subfield scheduling for throughput maximization in electron-beam photomask fabrication
- 作者Babin, Sergey V.; Kahng, Andrew B.; Mandoiu, Ion I.; Muddu, Swamy; Engelstad, Roxann L.
- 卷第5037卷
- 印刷ISSN0277-786X
- 文件大小199.92KB
- 发表时间2003
- DOI10.1117/12.484981
- 页码934-942