Transmission electron microscopy study of simultaneous high-dose C++N+ co-implantation into (1 1 1)Si
- 作者F.M. Morales; S.I. Molina; A. Ponce; D. Araújo; R. Garcı́a; L. Barbadillo; M. Cervera; J. Piqueras
- 卷第426卷
- 印刷ISSN0040-6090
- 文件大小4039.07KB
- 发表时间2003
- DOI10.1016/s0040-6090(02)01284-1
- 页码16-30
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