Some recent developments in the MOCVD and ALD of high-? dielectric oxides

• 期刊名称Journal of Materials Chemistry
• 作者Jones, Anthony C.; Aspinall, Helen C.; Chalker, Paul R.; Potter, Richard J.; Kukli, Kaupo; Rahtu, Antti; Ritala, Mikko; Leskel�, Markku
• 卷第14卷
• 期第21期
• 印刷ISSN0959-9428
• 电子ISSN1364-5501
• 文件大小726.64KB
• 发表时间2004
• DOI10.1039/B405525J