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Interfacial reactions of ultrahigh-vacuum-deposited Cu thin films on Si, Ge and on epitaxial Si–Ge layers on Si and Ge

Interfacial reactions of ultrahigh-vacuum-deposited Cu thin films on Si, Ge and on epitaxial Si–Ge layers on Si and Ge

L.J. Chen; C.S. Liu; J.B. Lai

作者L.J. Chen; C.S. Liu; J.B. Lai
卷第7卷
期第3期
印刷ISSN1369-8001
文件大小821.77KB
发表时间2004
DOI10.1016/j.mssp.2004.06.003
页码143-156

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