Silicidation-induced band gap shrinkage in Ge epitaxial films on Si
- 期刊名称Applied Physics Letters
- 作者Liu, Jifeng; Cannon, Douglas D.; Wada, Kazumi; Ishikawa, Yasuhiko; Jongthammanurak, Samerkhae; Danielson, David T.; Michel, Jurgen; Kimerling, Lionel C.
- 卷第84卷
- 期第5期
- 印刷ISSN0003-6951
- 文件大小399.79KB
- 发表时间2004
- DOI10.1063/1.1644618
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