Properties of C[sub 4]F[sub 8] inductively coupled plasmas. I. Studies of Ar/c-C[sub 4]F[sub 8] magnetically confined plasmas for etching of SiO[sub 2]
Li, Xi; Ling, Li; Hua, Xuefeng; Oehrlein, Gottlieb S.; Wang, Yicheng; Vasenkov, Alex V.; Kushner, Mark J.
- 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- 作者Li, Xi; Ling, Li; Hua, Xuefeng; Oehrlein, Gottlieb S.; Wang, Yicheng; Vasenkov, Alex V.; Kushner, Mark J.
- 卷第22卷
- 期第3期
- 印刷ISSN0734-2101
- 文件大小770.95KB
- 发表时间2004
- DOI10.1116/1.1697482