Modeling Atomistic Ion-Implantation and Diffusion for Simulating Intrinsic Fluctuation in MOSFETs arising from Line-Edge Roughness
- 期刊名称MRS Proceedings
- 作者Hane, Masami; Ikezawa, Takeo; Ezaki, Tatsuya
- 卷第810卷
- 电子ISSN1946-4274
- 文件大小1195.08KB
- 发表时间2004-1
- DOI10.1557/PROC-810-C6.1
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