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Surface diffusion during decay of nano-island on Si(1 0 0) at high temperature

Surface diffusion during decay of nano-island on Si(1 0 0) at high temperature

S. Toyoshima; T. Kawamura; S. Nishida; A. Ichimiya

作者S. Toyoshima; T. Kawamura; S. Nishida; A. Ichimiya
卷第572卷
期第1期
印刷ISSN0039-6028
文件大小606.88KB
发表时间2004
DOI10.1016/j.susc.2004.08.027
页码84-92

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