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Scanning thermal lithography: Maskless, submicron thermochemical patterning of photoresist by ultracompliant probes

Scanning thermal lithography: Maskless, submicron thermochemical patterning of photoresist by ultracompliant probes

A. S. Basu; S. Mcnamara; Y. B. Gianchandani

作者A. S. Basu; S. Mcnamara; Y. B. Gianchandani
文件大小752.28KB
发表时间2004
DOI10.1116/1.1808732

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