In situ lateral patterning of thin films of various materials deposited by physical vapor deposition
- 期刊名称Journal of Materials Research
- 作者Zhang, Chi; Kalyanaraman, Ramki
- 卷第19卷
- 期第2期
- 印刷ISSN0884-2914
- 电子ISSN2044-5326
- 文件大小1773.22KB
- 发表时间2004-2
- DOI10.1557/jmr.2004.0074
- 页码595-599
IntroductionGuest Editor:, ; Hertz, Joshua L.; Principal Editors:, ; Di Vona, Maria Luisa; Knauth, Philippe; Tuller, Harry L. · Journal of Materials Research · 2012
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