Improvement of the electrical properties of PECVD silicon oxide using high-density and low-ion-energy plasma post-treatment
- 作者Chuan Jie Zhong; Hiroaki Tanaka; Shigetoshi Sugawa; Tadahiro Ohmi
- 卷第351卷
- 印刷ISSN0022-3093
- 文件大小162.16KB
- 发表时间2005
- DOI10.1016/j.jnoncrysol.2005.06.016
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