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Impact of titanium addition on film characteristics of HfO[sub 2] gate dielectrics deposited by atomic layer deposition

Impact of titanium addition on film characteristics of HfO[sub 2] gate dielectrics deposited by atomic layer deposition

Triyoso, D. H.; Hegde, R. I.; Zollner, S.; Ramon, M. E.; Kalpat, S.; Gregory, R.; Wang, X.-D.; Jiang, J.; Raymond, M.; Rai, R.; Werho, D.; Roan, D.; White, B. E.; Tobin, P. J.
  • 期刊名称Journal of Applied Physics
  • 作者Triyoso, D. H.; Hegde, R. I.; Zollner, S.; Ramon, M. E.; Kalpat, S.; Gregory, R.; Wang, X.-D.; Jiang, J.; Raymond, M.; Rai, R.; Werho, D.; Roan, D.; White, B. E.; Tobin, P. J.
  • 卷第98卷
  • 期第5期
  • 印刷ISSN0021-8979
  • 文件大小785.39KB
  • 发表时间2005
  • DOI10.1063/1.2030407
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