[IEEE kshop on Junction Technology - Osaka, Japan (2005.06.7-2005.06.8)] Extended Abstracts of the Fifth International Workshop on Junction Technology - Performance enhancement in aggressively scaled CMOS devices higher carrier activation with laser spike annealing
- 作者Yamamoto, T.; Kubo, T.; Sukegawa, T.; Wang, Y.; Feng, L.; Talwar, S.; Kase, M.
- 文件大小1708.86KB
- 发表时间2005
- DOI10.1109/iwjt.2005.203868
- 页码19-22
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