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[IEEE kshop on Junction Technology - Osaka, Japan (2005.06.7-2005.06.8)] Extended Abstracts of the Fifth International Workshop on Junction Technology - A new junction technology for low-resistance contacts and Schottky barrier MOSFETs

[IEEE kshop on Junction Technology - Osaka, Japan (2005.06.7-2005.06.8)] Extended Abstracts of the Fifth International Workshop on Junction Technology - A new junction technology for low-resistance contacts and Schottky barrier MOSFETs

Grupp, D.E.; Connelly, D.; Faulkner, C.; Clifton, P.A.

作者Grupp, D.E.; Connelly, D.; Faulkner, C.; Clifton, P.A.
文件大小2044.99KB
发表时间2005
DOI10.1109/iwjt.2005.203895
页码103-106

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