Properties of Functionalized Redox-Active Monolayers on Thin Silicon Dioxide—A Study of the Dependence of Retention Time on Oxide Thickness
Mathur, G.; Gowda, S.; Li, Q.; Surthi, S.; Zhao, Q.; Misra, V.
- 期刊名称IEEE Transactions On Nanotechnology
- 作者Mathur, G.; Gowda, S.; Li, Q.; Surthi, S.; Zhao, Q.; Misra, V.
- 卷第4卷
- 期第2期
- 印刷ISSN1536-125X
- 文件大小556.97KB
- 发表时间2005-03
- DOI10.1109/tnano.2004.842056
- 页码278-283