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Opacity of neutral and low ion stages of Sn at the wavelength 13.5 nm used in extreme-ultraviolet lithography

Opacity of neutral and low ion stages of Sn at the wavelength 13.5 nm used in extreme-ultraviolet lithography

Lysaght, M.; Kilbane, D.; Murphy, N.; Cummings, A.; Dunne, P.; O’Sullivan, G.

期刊名称Physical Review A
作者Lysaght, M.; Kilbane, D.; Murphy, N.; Cummings, A.; Dunne, P.; O’Sullivan, G.
卷第72卷
期第1期
印刷ISSN1050-2947
电子ISSN1094-1622
文件大小451.91KB
发表时间2005-7-15
DOI10.1103/PhysRevA.72.014502

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