Carbon hard masks for etching sub-90 nm structures
Kevin A. Pears; Momtchil Stavrev; Alessia Scire; Ralf Koepe; Matthias Markert; Ulrich Egger; Lee Donohue
- 作者Kevin A. Pears; Momtchil Stavrev; Alessia Scire; Ralf Koepe; Matthias Markert; Ulrich Egger; Lee Donohue
- 卷第81卷
- 期第1期
- 印刷ISSN0167-9317
- 文件大小714.31KB
- 发表时间2005
- DOI10.1016/j.mee.2005.05.002
- 页码156-161