Effects of Low-temperature NH[sub 3] Treatment on the Characteristics of HfO[sub 2]∕SiO[sub 2] Gate Stack
- 期刊名称Journal of The Electrochemical Society
- 作者Lu, Wen-Tai; Chien, Chao-Hsin; Huang, Ing-Jye; Yang, Ming-Jui; Lehnen, Peer; Huang, Tiao-Yuan
- 卷第152卷
- 期第11期
- 印刷ISSN0013-4651
- 文件大小541.25KB
- 发表时间2005
- DOI10.1149/1.2039629
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