Statistical analysis of tunnel currents in scaled MOS structures with a non-uniform oxide thickness distribution

• 作者S.E. Tyaginov; M.I. Vexler; A.F. Shulekin; I.V. Grekhov
• 卷第49卷
• 期第7期
• 印刷ISSN0038-1101
• 文件大小360.94KB
• 发表时间2005
• DOI10.1016/j.sse.2005.04.007
• 页码1192-1197