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Film strain and compositional changes in thermally nitrided silicon dioxide thin films

Film strain and compositional changes in thermally nitrided silicon dioxide thin films

Anindya Dasgupta; Dong-Un Jin; Christos G. Takoudis

作者Anindya Dasgupta; Dong-Un Jin; Christos G. Takoudis
卷第472卷
印刷ISSN0040-6090
文件大小310.99KB
发表时间2005
DOI10.1016/j.tsf.2004.06.148
页码270-274

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