Effect of power density on the structure properties of microcrystalline silicon film prepared by high-density low-ion-energy microwave plasma

• 作者Chuan Jie Zhong; Hiroaki Tanaka; Shigetoshi Sugawa; Tadahiro Ohmi
• 卷第493卷
• 印刷ISSN0040-6090
• 文件大小279.05KB
• 发表时间2005
• DOI10.1016/j.tsf.2005.06.047
• 页码54-59