发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

MOS-diode characteristics of ultrathin Al[sub 2]O[sub 3] gate dielectrics after exposure to an electron-cyclotron-resonance plasma stream

MOS-diode characteristics of ultrathin Al[sub 2]O[sub 3] gate dielectrics after exposure to an electron-cyclotron-resonance plasma stream

Y. Jin; K. Saito; M. Shimada; T. Ono

作者Y. Jin; K. Saito; M. Shimada; T. Ono
文件大小556.29KB
发表时间2005
DOI10.1116/1.1941250

← 返回【学霸图书馆】主页