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Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic

Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic

P. P. Naulleau; J. P. Cain; K. A. Goldberg
  • 作者P. P. Naulleau; J. P. Cain; K. A. Goldberg
  • 文件大小517.17KB
  • 发表时间2005
  • DOI10.1116/1.2037647
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