Defects Induced by Carbon Contamination in Low-Temperature Epitaxial Silicon Films Grown with Monosilane
- 期刊名称Japanese Journal of Applied Physics
- 作者Sato, Shin'ya; Mizushima, Ichiro; Miyano, Kiyotaka; Sato, Tsutomu; Nakamura, Shin'ichi; Tsunashima, Yoshitaka; Arikado, Tsunetoshi; Uchitomi, Naotaka
- 卷第44卷
- 期第3期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小255.68KB
- 发表时间2005-3-8
- DOI10.1143/JJAP.44.1169
- 页码1169-1173
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