SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Modeling OPC complexity for design for manufacturability
- 作者Gupta, Puneet; Weed, J. Tracy; Martin, Patrick M.; Kahng, Andrew B.; Muddu, Swamy; Nakagawa, Sam; Park, Chul-Hong
- 卷第5992卷
- 印刷ISSN0277-786X
- 文件大小250.81KB
- 发表时间2005
- DOI10.1117/12.633416
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